X Initiative Anniversary Forum at the Design Automation Conference

WHAT: EDA and Semiconductor industry leaders will gather for the first

annual X Initiative Anniversary Forum at the 2002 Design

Automation Conference for a lively discussion on the merits,

challenges and rewards of the industry's most significant

revolution since copper dual damascene. Panel discussion centers

on the topic: Diagonals - Are They Worth It?

    WHERE:   Morial Convention Center
             Room #296
             New Orleans, LA

    WHEN:    Tuesday, June 11
             7:30 - 9:00 a.m.

    WHO:     Aki Fujimura, President and COO, Simplex Solutions, Inc.
             Joe Hutt, Vice President, Magma Design Automation
             Marco Montalti, Director of Design Methodology,
              STMicroelectronics
             Dr. Chris Rowen, President and CEO, Tensilica
             Ken Rygler, Rygler & Associates and Founder, DuPont Photomasks,
              Inc.

             IC designers, fab managers, and process, yield and applications
             engineers within the semiconductor and semiconductor equipment
             industries will benefit from this highly informative seminar.

    CONTACT:  For more information and to RSVP, please contact
              Brandy Heartburg at MCA, phone:  650-968-8900 or email:
              bheartburg@mcapr.com

About the X Initiative:

The X Initiative, a group of leading companies from throughout the semiconductor industry, is chartered with accelerating the availability and fabrication of the X Architecture, a revolutionary interconnect architecture based on the pervasive use of diagonal routing. The X Initiative's five-year mission is to provide an independent source of education about the X Architecture, to facilitate support and fabrication of the X Architecture through the semiconductor industry supply chain, and to survey usage of the X Architecture to track its adoption. Representing leaders spanning the entire design-to-silicon infrastructure, X Initiative members include: Artisan Components, Inc.; ASML Netherlands B.V.; Dai Nippon Printing (DNP); DuPont Photomasks, Inc.; Etec Systems, Inc., an Applied Materials, Inc. company; HPL Technologies, Inc.; KLA-Tencor Corporation; Leica Microsystems AG; Matsushita Electric Industrial Co., Ltd.; MicroArk Co. Ltd.; Monterey Design Systems, Inc.; Numerical Technologies, Inc.; NurLogic Design, Inc.; PDF Solutions, Inc.; Photronics, Inc.; Prolific, Inc.; RUBICAD Corporation; Sagantec; Sanyo Electric Co., Ltd.; Silicon Logic Engineering, Inc.; SiliconMap, LLC.; Silicon Perspective Corp.; Silicon Valley Research Inc.; Simplex Solutions, Inc.; STMicroelectronics; Sycon Design, Inc.; Tensilica, Inc.; Toppan Printing Co.; Toshiba Machine Co., Ltd.; Toshiba Corporation; Virage Logic, Inc.; Virtual Silicon Technology, Inc.; and Zygo Corporation. Membership is open to all companies throughout the semiconductor supply chain. Materials can be found at www.xinitiative.org.

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